Hydrophobic Conversion of the Chemical-Vapor-Deposited SiO 2 Surface
- 期刊名称Japanese Journal of Applied Physics
- 作者Yanazawa, Hiroshi; Utsugi, Hiroshi; Hashimoto, Norikazu; Ashikawa, Mikio
- 卷第13卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小681.59KB
- 发表时间1974-01-01
- DOI10.7567/JJAPS.2S1.753
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