Effect of surface condition on diffusion in thin films at low temperatures
- 期刊名称Applied Physics Letters
- 作者Hwang, J. C. M.; Ho, P. S.; Balluffi, R. W.
- 卷第33卷
- 期第5期
- 印刷ISSN0003-6951
- 文件大小534.50KB
- 发表时间1978
- DOI10.1063/1.90378
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