Low Oxygen Content Czochralski Silicon Crystal Growth
- 期刊名称Japanese Journal of Applied Physics
- 作者Hoshikawa, Keigo; Kohda, Hiroki; Hirata, Hiroshi; Nakanishi, Hideo
- 卷第19卷
- 期第1期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小416.21KB
- 发表时间1980-1
- DOI10.1143/jjap.19.l33
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