Plasma etching characteristics of sputtered MoSi2 films
- 期刊名称Applied Physics Letters
- 作者Chow, T. P.; Steckl, A. J.
- 卷第37卷
- 期第5期
- 印刷ISSN0003-6951
- 文件大小464.66KB
- 发表时间1980
- DOI10.1063/1.91967
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