XPS Determination of Amount of Incorporated Rare Gas in Amorphous Silicon Films Produced with Reactive Sputtering Method
- 期刊名称Japanese Journal of Applied Physics
- 作者Usami, Katsuhisa; Katayama, Yoshifumi; Shimada, Toshikazu
- 卷第19卷
- 期第11期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小303.65KB
- 发表时间1980-11
- DOI10.1143/JJAP.19.2065
- 页码2065-2068
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