Observation of Si-2p Level Shift in Hydrogenated Amorphous Silicon by X-Ray Photoelectron Spectroscopy
- 期刊名称Japanese Journal of Applied Physics
- 作者Usami, Katsuhisa; Shimada, Toshikazu; Katayama, Yoshifumi
- 卷第19卷
- 期第7期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小358.47KB
- 发表时间1980-7
- DOI10.1143/JJAP.19.L389
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