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Behavior of Plasmons in an Amorphous Silicon-Carbon Alloy System Studied by X-Ray Photoelectron Spectroscopy

Behavior of Plasmons in an Amorphous Silicon-Carbon Alloy System Studied by X-Ray Photoelectron Spectroscopy

Katayama, Yoshifumi; Shimada, Toshikazu; Usami, Katsuhisa

期刊名称Physical Review Letters
作者Katayama, Yoshifumi; Shimada, Toshikazu; Usami, Katsuhisa
卷第46卷
期第17期
印刷ISSN0031-9007
文件大小687.68KB
发表时间1981-4-27
DOI10.1103/physrevlett.46.1146
页码1146-1149

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