Effect of Mixing Hydrogen-Argon on Magnetron Sputtered SiO 2 Films
- 期刊名称Japanese Journal of Applied Physics
- 作者Serikawa, Tadashi; Yachi, Toshiaki
- 卷第20卷
- 期第2期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小300.41KB
- 发表时间1981-2
- DOI10.1143/jjap.20.l111
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