Surface composition and etching of III‐V semiconductors in Cl2 ion beams
- 作者Barker, R. A.; Mayer, T. M.; Burton, Randolph H.
- 卷第40卷
- 期第7期
- 电子ISSN0003-6951
- 文件大小548.66KB
- 发表时间1982
- DOI10.1063/1.93188
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