发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

$The use of pulsed laser irradiation in silicon molecular beam epitaxy: A comparative low energy electron diffraction study$

The use of pulsed laser irradiation in silicon molecular beam epitaxy: A comparative low energy electron diffraction study

de Jong, T.

期刊名称Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
作者de Jong, T.
卷第1卷
期第4期
印刷ISSN0734-211X
文件大小1710.73KB
发表时间1983
DOI10.1116/1.582709

← 返回【学霸图书馆】主页