Crystallization of amorphous silicon films during low pressure chemical vapor deposition
- 期刊名称Applied Physics Letters
- 作者Kinsbron, E.
- 卷第42卷
- 期第9期
- 印刷ISSN0003-6951
- 文件大小534.58KB
- 发表时间1983
- DOI10.1063/1.94080
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