Lateral diffusion of arsenic in low pressure chemical vapor deposited polycrystalline silicon
- 期刊名称Applied Physics Letters
- 作者Lewis, N.
- 卷第42卷
- 期第2期
- 印刷ISSN0003-6951
- 文件大小321.78KB
- 发表时间1983
- DOI10.1063/1.93863
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