A 100 kV Maskless Ion-Implantation System with an Au-Si-Be Liquid Metal Ion Source for III-V Compound Semiconductors
- 期刊名称Japanese Journal of Applied Physics
- 作者Miyauchi, Eizo; Arimoto, Hiroshi; Hashimoto, Hisao; Furuya, Tsuneo; Utsumi, Takao
- 卷第22卷
- 印刷ISSN0021-4922
- 文件大小455.10KB
- 发表时间1983-5-20
- DOI10.1143/jjap.22.l287
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