SPIE Proceedings [SPIE 1983 Microlithography Conferences - Santa Clara (Monday 14 March 1983)] Optical Microlithography II: Technology for the 1980s - Performance Of Merck Selectilux P Positive Photoresist In Aluminium Plasma Etching And High Current Ion Implantation
- 作者Thiel, Klaus; Stover, Harry L.
- 卷第394卷
- 印刷ISSN0277-786X
- 文件大小11016.44KB
- 发表时间1983
- DOI10.1117/12.935129
- 页码116-124
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