Residual disorder in low-temperature polycrystalline silicon
- 作者E. Bustarret; A. Deneuville; R. Grosleau; L. C. Brunel; M. Brunel
- 卷第13卷
- 期第4期
- 印刷ISSN0361-5235
- 电子ISSN1543-186X
- 文件大小606.74KB
- 发表时间1984-07
- DOI10.1007/bf02653988
- 页码673-687
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