Dependences of Magnetron-Sputtered SiO[sub 2] Film Properties on Argon Pressure
- 期刊名称Journal of The Electrochemical Society
- 作者Yachi, Toshiaki
- 卷第131卷
- 期第11期
- 印刷ISSN0013-4651
- 文件大小866.07KB
- 发表时间1984
- DOI10.1149/1.2115391
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