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Evaluation of Boron and Phosphorus Doping Microcrystalline Silicon Films

Evaluation of Boron and Phosphorus Doping Microcrystalline Silicon Films

H. Kaya; T. Imura; T. Kusao; A. Hiraki; O. Nakamura; Y. Okayasu; M. Matsumura

作者H. Kaya; T. Imura; T. Kusao; A. Hiraki; O. Nakamura; Y. Okayasu; M. Matsumura
文件大小204.27KB
发表时间1984
DOI10.1143/JJAP.23.L549

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