Oxygen diffusion and reaction at annealed InSb MOS interfaces
- 作者J. Bregman; Yoram Shapira; Z. Calahorra; Leonard J. Brillson
- 卷第178卷
- 文件大小774.69KB
- 发表时间1986
- DOI10.1016/0039-6028(86)90295-5
- 页码188-200
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