Stress relaxation technique for thermally grown SiO2
- 期刊名称Applied Physics Letters
- 作者Landsberger, L. M.; Tiller, W. A.
- 卷第49卷
- 期第3期
- 印刷ISSN0003-6951
- 文件大小433.25KB
- 发表时间1986
- DOI10.1063/1.97205
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