Growth Mechanism of ZnS and ZnSe Films in Low-Pressure MOCVD
- 期刊名称Japanese Journal of Applied Physics
- 作者Yoshikawa, Akihiko; Sirai, Atsuhisa; Yamaga, Shigeki; Kasai, Haruo
- 卷第25卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小215.53KB
- 发表时间1986-5-20
- DOI10.1143/JJAP.25.673
- 页码673-678
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