Surface Photochemically Activated Chemical Vapor Deposition of Patterned Aluminum Thin Films
- 期刊名称MRS Proceedings
- 作者Higashi, G. S.; Blonder, G. E.; Fleming, C. G.
- 卷第75卷
- 电子ISSN1946-4274
- 文件大小3305.71KB
- 发表时间1986-1
- DOI10.1557/proc-75-117
同期刊推荐
Ultra Thin Flexible Glass SubstratesPlichta, Armin; Weber, Andreas; Habeck, Andreas · MRS Proceedings · 2003
Principles of Ion MixingMatteson, S.; Nicolet, M.-A. · MRS Proceedings · 1981
Phase Transitions in Pure PlutoniumMitchell, Jeremy N.; Freibert, Franz, J.; Schwartz, Daniel S. · MRS Proceedings · 2012
Spintronics in NitridesDietl, Tomasz · MRS Proceedings · 2004
Dielectric Relaxation Of Semicrystalline PolyimidesHuo, Pengtao; Friler, Jerome; Cebe, Peggy · MRS Proceedings · 1991
Carbon Aerogels and XerogelsPekala, Richard W.; Alviso, Cynthia T. · MRS Proceedings · 1992
Why Covalent Ceramics are HardGilman, John J. · MRS Proceedings · 1993
Microwave Processing of Ceramics - An OverviewSutton, Willard H. · MRS Proceedings · 1992