Rutherford Backscattering (RBS) and Channeling Studies of Defects in Arsenic Implanted Silicon Induced by Arsenic Clustering
- 期刊名称MRS Proceedings
- 作者Baiocchi, Frank A.; Kamgar, Avid
- 卷第82卷
- 电子ISSN1946-4274
- 文件大小302.56KB
- 发表时间1986-1
- DOI10.1557/proc-82-115
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