Activation and diffusion during rapid thermal annealing of arsenic and boron implanted silicon
- 作者J.J. Grob; S. Unamuno; A. Grob; M. Ajaka; A. Slaoui; R. Stuck
- 印刷ISSN0168-583X
- 文件大小400.53KB
- 发表时间1987
- DOI10.1016/s0168-583x(87)80100-3
- 页码501-506
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