Hydrogen-Induced Defects in Silicon by CF4/x% H2 (0≤x≤ 100) RIE and H2 Plasma
- 期刊名称MRS Proceedings
- 作者Jeng, Shwu-Jen; Oehrlein, Gottlieb S.; Scilla, Gerald J.
- 卷第104卷
- 电子ISSN1946-4274
- 文件大小1428.31KB
- 发表时间1987-1
- DOI10.1557/proc-104-247
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