ChemInform Abstract: Reactive Etching of Positive and Negative Silicon Cluster Ions by Nitrogen Dioxide.
- 期刊名称ChemInform
- 作者MANDICH, M. L.; BONDYBEY, V. E.; REENTS, W. D. JUN.
- 卷第18卷
- 期第28期
- 印刷ISSN0931-7597
- 文件大小149.79KB
- 发表时间1987-07-14
- DOI10.1002/chin.198728028
同期刊推荐
All in One - Complete Issue: ChemInform 2/2013ChemInform · 2013
ChemInform Abstract: Intrinsic PropertiesMichalowsky, Lothar; Dreikorn, Joerg · ChemInform · 2012
ChemInform Abstract: Magnetic Random Access MemoryOogane, Mikihiko; Miyazaki, Terunobu · ChemInform · 2012
ChemInform Abstract: Aromatic Radical Perfluoroalkylation ReactionsPostigo, Al · ChemInform · 2012
ChemInform Abstract: Wine and HeterocyclesWamhoff, Heinrich; Gribble, Gordon W. · ChemInform · 2012
Author Index: ChemInform 45/2012ChemInform · 2012
Index of Classification Terms: ChemInform 45/2012ChemInform · 2012
ChemInform Abstract: Strongly Correlated MaterialsMorosan, Emilia; Natelson, Douglas; Nevidomskyy, Andriy H.; Si, Qimiao · ChemInform · 2012