Rotational distribution of nascent OH radicals after H2O2photolysis at 193 nm
- 作者A. Jacobs; M. Wahl; R. Weller; J. Wolfrum
- 卷第42卷
- 期第3期
- 印刷ISSN0946-2171
- 电子ISSN1432-0649
- 文件大小596.15KB
- 发表时间1987-03
- DOI10.1007/bf00693881
- 页码173-179
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