Electron-Beam Exposure(EBE) and Epitaxy of GaAs Films on CaF2/Si Structures
Lee, Hee Chul; Asano, Tanemasa; Ishiwara, Hiroshi; Furukawa, Seijiro
- 作者Lee, Hee Chul; Asano, Tanemasa; Ishiwara, Hiroshi; Furukawa, Seijiro
- 卷第27卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小2896.38KB
- 发表时间1988
- DOI10.1143/jjap.27.1616
- 页码1616-1625