Effect of nitrogen ion implantation on the electrochemical behaviour of TA6V in sulphuric medium

• 作者A.M. De Becdelievre; D. Fleche; J. De Becdelievre
• 卷第33卷
• 期第8期
• 印刷ISSN0013-4686
• 文件大小499.35KB
• 发表时间1988
• DOI10.1016/0013-4686(88)80196-8
• 页码1067-1072