Investigation of triethylarsenic as a replacement for arsine in the metalorganic chemical vapor deposition of GaAs
- 期刊名称Applied Physics Letters
- 作者Lum, R. M.; Klingert, J. K.; Wynn, A. S.; Lamont, M. G.
- 卷第52卷
- 期第18期
- 印刷ISSN0003-6951
- 文件大小637.81KB
- 发表时间1988
- DOI10.1063/1.99103
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