Epitaxy of CoSi2 on Si (111) at low temperature (≤400 °C)
- 期刊名称Applied Physics Letters
- 作者Haderbache, L.; Wetzel, P.; Pirri, C.; Peruchetti, J. C.; Bolmont, D.; Gewinner, G.
- 卷第53卷
- 期第15期
- 印刷ISSN0003-6951
- 文件大小598.14KB
- 发表时间1988
- DOI10.1063/1.100456
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