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Effects of Rapid Thermal Processing on SiO2/GaAs Interfaces

Effects of Rapid Thermal Processing on SiO2/GaAs Interfaces

Tokuda, Yutaka; Katayama, Masayuki; Ando, Nobuo; Kitagawa, Akio; Usami, Akira; Inoue, Yajiro; Takematsu, Hideo; Wada, Takao
  • 期刊名称MRS Proceedings
  • 作者Tokuda, Yutaka; Katayama, Masayuki; Ando, Nobuo; Kitagawa, Akio; Usami, Akira; Inoue, Yajiro; Takematsu, Hideo; Wada, Takao
  • 卷第126卷
  • 电子ISSN1946-4274
  • 文件大小347.95KB
  • 发表时间1988-1
  • DOI10.1557/proc-126-215
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