SPIE Proceedings [SPIE Medical Imaging II - Newport Beach, CA (Sunday 31 January 1988)] Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII - Sub-Half Micrometer Gate Lift-Off By Three Layer Resist Process Via Electron Beam Lithography For Gallium Arsenide Monolithic Microwave Integrated Circuits (MIMICs)
Nagarajan, Rao M.; Rask, Steven D.; King, Michael R.; Yard, Thomas K.; Yanof, Arnold W.
- 作者Nagarajan, Rao M.; Rask, Steven D.; King, Michael R.; Yard, Thomas K.; Yanof, Arnold W.
- 卷第923卷
- 印刷ISSN0277-786X
- 文件大小8771.35KB
- 发表时间1988
- DOI10.1117/12.945650
- 页码194-200