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Characterization of Si +-implanted GaAs substrates using thermal-wave measurement

Characterization of Si +-implanted GaAs substrates using thermal-wave measurement

Naotaka Uchitomi; Hitoshi Mikami; Kenichi Tomita; Nobuyuki Toyoda

作者Naotaka Uchitomi; Hitoshi Mikami; Kenichi Tomita; Nobuyuki Toyoda
印刷ISSN0168-583X
文件大小420.05KB
发表时间1989
DOI10.1016/0168-583x(89)90303-0
页码810-813

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