Effect of resputtering on composition of WSix films deposited by multilayer sputtering: R Bruce et al,J Vac Sci Technol,A6, 1988, 1642–1645

• 卷第39卷
• 期第10期
• 印刷ISSN0042-207X
• 文件大小150.26KB
• 发表时间1989
• DOI10.1016/0042-207x(89)90771-9