Surface hydrogen content and passivation of silicon deposited by plasma induced chemical vapor deposition from silane and the implications for the reaction mechanism
- 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- 作者Vepřek, S.
- 卷第7卷
- 期第4期
- 印刷ISSN0734-2101
- 文件大小1060.77KB
- 发表时间1989-7
- DOI10.1116/1.575806
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