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[IEEE International Technical Digest on Electron Devices Meeting - Washington, DC, USA (3-6 Dec. 1989)] International Technical Digest on Electron Devices Meeting - Non-alloyed Al ohmic contact to GaAs for GaAs/Si interconnect compatibility

[IEEE International Technical Digest on Electron Devices Meeting - Washington, DC, USA (3-6 Dec. 1989)] International Technical Digest on Electron Devices Meeting - Non-alloyed Al ohmic contact to GaAs for GaAs/Si interconnect compatibility

Goossen, K.W.; Cunningham, J.E.; Chiu, T.H.; Miller, D.A.B.; Chemla, D.S.

作者Goossen, K.W.; Cunningham, J.E.; Chiu, T.H.; Miller, D.A.B.; Chemla, D.S.
文件大小173.96KB
发表时间1989
DOI10.1109/iedm.1989.74309
页码409-410

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