SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Picosecond Electron-Beam And Synchrotron Radiation Pulse Radiolysis For Studies On Electron-Beam And X-Ray Resists
- 作者Yoshida, Yoichi; Shibata, Hiromi; Tagawa, Seiichi; Washio, Masakazu; Tabata, Yoneho; Kouchi, Noriyuki; Ogata, Atsushi; Reichmanis, Elsa
- 卷第1086卷
- 印刷ISSN0277-786X
- 文件大小303.98KB
- 发表时间1989
- DOI10.1117/12.953039
- 页码274-281
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