![Development of OXSIM2D: A Simulation Program of SiO2 Growth and Stress Generation in Thermal Oxidation Process of Silicon.]()
Development of OXSIM2D: A Simulation Program of SiO2 Growth and Stress Generation in Thermal Oxidation Process of Silicon.SAITO, Naoto; SAKATA, Shinji; IKEGAWA, Masahiro; MIURA, Hideo; OHTA, Hiroyuki; SHIMIZU, Tasuku; ISOMAE, Seiichi; MASUDA, Hiroo · Transactions of the Japan Society of Mechanical Engineers Series A · 1991