Study of temperature-dependent ultrathin oxide growth on Si(111) using variable-angle spectroscopic ellipsometry
- 作者Bhola N. De; John A. Woollam
- 印刷ISSN0040-6090
- 文件大小311.82KB
- 发表时间1990
- DOI10.1016/s0040-6090(05)80040-9
- 页码312-317
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