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Properties of hydrogenated amorphous SiN films prepared by r.f. magnetron sputtering with emphasis on the non-stoichiometric region

Properties of hydrogenated amorphous SiN films prepared by r.f. magnetron sputtering with emphasis on the non-stoichiometric region

Ratnabali Banerjee; A.K. Bandyopadhyay; J.K. Rath; A.K. Batabyal; A.K. Barua

作者Ratnabali Banerjee; A.K. Bandyopadhyay; J.K. Rath; A.K. Batabyal; A.K. Barua
卷第192卷
期第2期
印刷ISSN0040-6090
文件大小550.10KB
发表时间1990
DOI10.1016/0040-6090(90)90074-n
页码295-307

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