Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation

• 作者Y. Vladimirsky; J.R. Maldonado; O. Vladimirsky; F. Cerrina; M. Hansen; R. Nachman; G.M. Wells
• 卷第11卷
• 印刷ISSN0167-9317
• 文件大小654.33KB
• 发表时间1990
• DOI10.1016/0167-9317(90)90117-c
• 页码287-293