Electron Beam Direct Writing Technologies for 0.3-µm ULSI Devices
- 期刊名称Japanese Journal of Applied Physics
- 作者Moriizumi, Koichi; Takeuchi, Susumu; Fujino, Takeshi; Aoyama, Satoshi; Yoneda, Masahiro; Morimoto, Hiroaki; Watakabe, Yaichiro
- 卷第29卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小349.42KB
- 发表时间1990-11-20
- DOI10.1143/jjap.29.2584
- 页码2584-2589
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