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Suppression of Crystal Nucleation in Amorphous Si Thin Films by High Energy Ion Irradiation at Intermediate Temperatures

Suppression of Crystal Nucleation in Amorphous Si Thin Films by High Energy Ion Irradiation at Intermediate Temperatures

Im, James S.; Shin, Jung H.; Atwater, Harry A.

期刊名称MRS Proceedings
作者Im, James S.; Shin, Jung H.; Atwater, Harry A.
卷第201卷
电子ISSN1946-4274
文件大小1564.25KB
发表时间1990-1
DOI10.1557/proc-201-357

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