Suppression of Crystal Nucleation in Amorphous Si Thin Films by High Energy Ion Irradiation at Intermediate Temperatures
Im, James S.; Shin, Jung H.; Atwater, Harry A.
- 期刊名称MRS Proceedings
- 作者Im, James S.; Shin, Jung H.; Atwater, Harry A.
- 卷第205卷
- 电子ISSN1946-4274
- 文件大小1560.95KB
- 发表时间1990-1
- DOI10.1557/proc-205-87