ChemInform Abstract: Atmospheric Pressure Chemical Vapor Deposition of Tungsten Silicide. The Dependence of Film Composition and Growth Rate on Gas Composition.
- 期刊名称ChemInform
- 作者DOBKIN, D.; BARTHOLOMEW, L.; MCDANIEL, G.; DEDONTNEY, J.
- 卷第21卷
- 期第31期
- 印刷ISSN0931-7597
- 文件大小140.64KB
- 发表时间1990-07-31
- DOI10.1002/chin.199031332
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