发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

ChemInform Abstract: Silicon Dioxide Deposition by Atmospheric Pressure and Low-Temperature CVD Using TEOS and Ozone.

ChemInform Abstract: Silicon Dioxide Deposition by Atmospheric Pressure and Low-Temperature CVD Using TEOS and Ozone.

FUJINO, K.; NISHIMOTO, Y.; TOKUMASU, N.; MAEDA, K.

期刊名称ChemInform
作者FUJINO, K.; NISHIMOTO, Y.; TOKUMASU, N.; MAEDA, K.
卷第21卷
期第47期
印刷ISSN0931-7597
文件大小145.13KB
发表时间1990-11-20
DOI10.1002/chin.199047264

← 返回【学霸图书馆】主页