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SPIE Proceedings [SPIE 1989 Microelectronic Intergrated Processing Conferences - Santa Clara (Tuesday 10 October 1989)] Multichamber and In-Situ Processing of Electronic Materials - <title>Effects Of HCl Gas And Hydrogen Mixture Etching On In Situ Cleaning Of GaAs Substrates In Molecular Beam Epitaxy</title>

SPIE Proceedings [SPIE 1989 Microelectronic Intergrated Processing Conferences - Santa Clara (Tuesday 10 October 1989)] Multichamber and In-Situ Processing of Electronic Materials - Effects Of HCl Gas And Hydrogen Mixture Etching On In Situ Cleaning Of GaAs Substrates In Molecular Beam Epitaxy

Saito, Junji; Kondo, Kazuo; Freund, Robert S.

作者Saito, Junji; Kondo, Kazuo; Freund, Robert S.
卷第1188卷
印刷ISSN0277-786X
文件大小7821.53KB
发表时间1990
DOI10.1117/12.963945
页码115-124

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