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SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - <title>Systematic investigation of the photoresponse and dissolution characteristics of an acid-hardening resist</title>

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Systematic investigation of the photoresponse and dissolution characteristics of an acid-hardening resist

Das, Siddhartha; Thackeray, James W.; Endo, Masayuki; Langston, Joseph C.; Gaw, Henry T.; Watts, Michael P. C.
  • 作者Das, Siddhartha; Thackeray, James W.; Endo, Masayuki; Langston, Joseph C.; Gaw, Henry T.; Watts, Michael P. C.
  • 卷第1262卷
  • 印刷ISSN0277-786X
  • 文件大小540.68KB
  • 发表时间1990
  • DOI10.1117/12.20088
  • 页码60-71
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