Polysilphenylenesiloxane Bi-level resist. TSPS.
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Watanabe, Keiji; Oikawa, Akira; Namiki, Takahisa; Yoneda, Yasuhiro
- 卷第3卷
- 期第2期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小264.74KB
- 发表时间1990
- DOI10.2494/photopolymer.3.201
- 页码201-206
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