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BF+2 implantation in predamaged Si with Ge+ or Si+ at doses lower than amorphization

BF+2 implantation in predamaged Si with Ge+ or Si+ at doses lower than amorphization

Masataka Kase; Mami Kimura; Yoshio Kikuchi; Haruhisa Mori; Tsutomu Ogawa

作者Masataka Kase; Mami Kimura; Yoshio Kikuchi; Haruhisa Mori; Tsutomu Ogawa
卷第55卷
印刷ISSN0168-583X
文件大小1105.81KB
发表时间1991
DOI10.1016/0168-583x(91)96228-d
页码550-554

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